Chemical and electronic properties of the ITO/Al(2)O(3) interface.
Identifieur interne : 002002 ( Main/Exploration ); précédent : 002001; suivant : 002003Chemical and electronic properties of the ITO/Al(2)O(3) interface.
Auteurs : RBID : pubmed:19370198Abstract
The interface formation between transparent conducting Sn-doped indium oxide (ITO) and dielectric aluminium oxide has been studied by photoelectron spectroscopy using in situ sample preparation by magnetron sputtering. The electronic structure including band alignment, changes in Fermi level position and work function is determined. The changes of Fermi level are related to the deposition technique used.
DOI: 10.1039/b822848e
PubMed: 19370198
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